Extreme Ultraviolet Anti Reflection Coatings

Extreme Ultraviolet Anti Reflection ARs from 100-200nm

These coatings hold up well in any Lab and are NASA Space Qualified.  We are one of the few companies in the world who deposit coatings below 200nm.  Since the early 80s, we have had direct involvement with several UVI launches imaging both the Earth and Sun.  These techniques have also transferred over well into the semi conductor industry.  Here we will display some of the ARs related to the projects we have been involved in.  Although, the window is only one portion of an instrument, we felt it necessary to display this unique capability separately

Extreme Ultraviolet Anti Reflection ARs from 100-200nm

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Extreme UV MgF2 Substrate With AR

Hydrogen is the Universes most abundant element, when not studying it directly, it becomes necessary to block its light emission as it will interfere with other desired lines of interest.  In this AR we actually utilize various coating types for their absorptive properties to remove unwanted light.  In this particular, example Atomic Oxygen(Long line) is being studied at 135.6nm, Even though it is not found in our atmosphere, Atomic Oxygen is found in Space and it's destructive nature causes corrosive damage to Satellites, The Shuttle, and the International Space Station

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Extreme Multiple CIV, N2 Known as Lyman-Birge-Hopfield

We have had many inquires within this band for various reasons.  In this particular case NASA was studying Solar "Space Weather" via the Carbon IV emission line at 157nm

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The Simi Conductor Industry at 193nm

 The Simi Conductor Industry has Long Used 193nm to etch Si for CMOS device chips.  This AR is designed for a prism with extreme angles of incidence 65-75º.  They are now going above and beyond to 13nm where  our coatings are rendered useless 

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