Extreme Ultraviolet Anti Reflection ARs from 100-200nm
Extreme UV MgF2 Substrate With AR
Hydrogen is the Universes most abundant element, when not studying it directly, it becomes necessary to block its light emission as it will interfere with other desired lines of interest. In this AR we actually utilize various coating types for their absorptive properties to remove unwanted light. In this particular, example Atomic Oxygen(Long line) is being studied at 135.6nm, Even though it is not found in our atmosphere, Atomic Oxygen is found in Space and it's destructive nature causes corrosive damage to Satellites, The Shuttle, and the International Space Station
Extreme Multiple CIV, N2 Known as Lyman-Birge-Hopfield
We have had many inquires within this band for various reasons. In this particular case NASA was studying Solar "Space Weather" via the Carbon IV emission line at 157nm
The Simi Conductor Industry at 193nm
The Simi Conductor Industry has Long Used 193nm to etch Si for CMOS device chips. This AR is designed for a prism with extreme angles of incidence 65-75º. They are now going above and beyond to 13nm where our coatings are rendered useless